DuPont EKC Technology: specialty chemicals used in the removal of photoresist and post-dry etch process residue

DuPont Home Global [change]

Our Company Science Sustainability Investor Center Media Center Career Center

«

«

«

Products

EKC Technology Home

Products Post-Etch Residue Removers Photoresist Removers WLP Photoresist Removers & TSV Cleaners Removers for LED Fabrication Post-CMP Cleaners Post Clean Treatments

Uses & Applications

Sales & Support

News & Events

Technical Info

Printer Friendly Version

DuPont Products & Services

DuPont Brands & Trademarks

Products DuPont EKC Technology is a leading manufacturer of specialty chemicals used in the removal of photoresist and post-dry etch process residue. Our products provide best in class process solutions for wafer cleaning, surface preparations, post CMP cleaning and post-etch residue/photoresist removal, enabling higher productivity, finer lines and improved yields. Explore our product offerings below. Photoresist Removers Organic materials specifically formulated to remove positive & negative photoresist from substrate surfaces. » More Post Clean Treatments Post clean treatments specifically formulated for use after post etch residue or photoresist removal and prior to the DI water rinse step. » More Post CMP Cleaners Post CMP cleaning is a yield enhancing process step that removes defects deposited during the planarization process. » More Post-Etch Residue Removers Aqueous & Semi-aqueous organic mixtures formulated to effectively remove residues from substrate surfaces after via, poly and metal etch processes. » More Removers for LED Fabrication Solutions formulated for the removal of positive- and negative-tone photoresists as well as plasma-hardened residues, compatible with a variety of metals required to form contacts for light emitting diodes (LEDs). » More Wafer Level Packaging Photoresist Removers & TSV Cleaners Formulations optimized to effectively remove thick and thin resists used for TSV masks and wafer bumping by solder electroplating or stencil printing. TSV masks and TSV cleaners are designed to effectively remove residues after TSV etch. » More		Helpful Links Product Information Product Data Sheets & Technical Bulletins
FAQ \| Site Map \| Legal Notices & Terms of Use \| PRIVACY . Copyright © 2012 DuPont or its affiliates. All rights reserved. The DuPont Oval Logo, DuPont™, The miracles of science™ and all products denoted with ® or ™ are registered trademarks or trademarks of E. I. du Pont de Nemours and Company or its affiliates.