Project Title:
Gate Post Etch Residue Remover
Project Objective:
To develop post etch residue removers for advanced gate structures, with minimum attack on gate stack layers (<1Å/min)
Project Title:
Post As Implant 193nm Photoresist Strip
Project Objective:
Removal of high-dose implanted photoresist
For additional information, please contact:
Karen Willwerth
Phone: 510-784-7528
e-mail: Karen.Willwerth@usa.dupont.com
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