EKC162™ WLP photo resist remover and the new WBR 2000 dry film resist were co-developed to work with the HD MicroSystems PI and PBO redistribution dielectrics to take the burden of lengthy qualification / integration of products off the customers' shoulders.
- Water rinseable semi-aqueous remover
- Co designed with DuPont WB Series Dry Film to strip in half the time of competitive strippers
- Fully Compatible with HD Microsystems PI & PBO redistribution dielectrics
- Strips at process temperature much lower than competition
- Capable of removing + 100 micron thick film
- Extended bathlife
- Easy rework of partially stripped resist
- Wet bench and spray tool compatible
- Pb/Sn, Sn/Ag, Cu, Ni, TiW compatible
- POR for production of high end logic devices
- Ability to rework uncured HD MicroSystems PI & PBO material
DuPont WBR Series Dry Film
For additional information, please contact:
Anthony Rardin
Phone: 510-784-7514
e-mail: Anthony.B.Rardin@usa.dupont.com
