DUV and 193nm photoresist performance begins with the polymer, and DuPont Electronic Polymers continues to improve upon existing techniques for polymer manufacture, isolation, and evaluation. Our synthetic and isolation expertise enables Electronic Polymers to create a wide range of polymers that are ideal for today’s challenging lithographic applications, from Acetoxystyrene Monomer (ASM) to High Compositional Uniformity (HCU) polymers.
Acetoxystyrene monomer (ASM) is the basic monomer for generation of DuPont electronic grade polymers. Used either in combination with other reactive monomers or used as the sole component for homopolymer generation, ASM is a high purity reactive monomer which readily undergoes free radical polymerization and enables the production of poly(p-acetoxy)styrene (PAS) polymers in a wide range of molecular weights. We exercise great care and effort to maintain the highest possible quality of this key material.
For additional information on ASM download: Data Sheet, MSDS
DuPont™ PHS-XE-01* is a low metals, 100% linear vinyl homopolymer available in a variety of molecular weights. DuPont electronic grade PHS differs from conventional phenolic resins not only in its purity, UV transparency at 248 nm, batch consistency and functional reactivity, but also in its structure. The linear structure lends itself to "blocking" with acid/base sensitive groups ideal for exposure and development in the semiconductor manufacturing process.
For additional information on PHS-XE-01 download: Data Sheet, MSDS
* "X" designates molecular weight; i.e. PHS10E01 has a molecular weight of 10,000.
DuPont PHS-XE-HP is a low metals, ultra-high purity, 100% linear vinyl homopolymer available in a variety of molecular weights. Produced via the same free radical chemistry from ASM as the DuPont standard PHS-XE-01, the high purity (HP) material process incorporates in situ fractionation and purification of the resin, yielding a product of higher 248 nm transparency, narrower polydispersity, higher Tg, and near zero impurities content.
For additional information on PHS-XE-HP download: Data Sheet
Electronic Polymers has developed a deep expertise in free radical polymerization chemistry. Custom produced resins made from a wide variety of monomers, in combination with ASM, address the growing needs for transparency, polydispersity, acid diffusion characteristics, dissolution rate, Tg, and other factors essential to the performance of photoresists used in critical layers of semiconductor device manufacture.
For additional information on Co- and Ter-Polymers download: Data Sheet