The miracles of science™

Select Industry


Semiconductor Fabrication materials from DuPont

Semiconductor Fabrication Materials

ITRS Emerging Technologies - Lithography

Advanced Resist Polymers

As 193 nm lithography extends to smaller dimensions through various resolution enhancement techniques, demands on photoresist properties are becoming increasingly stringent. We are developing new resist polymers to address critical issues such as line edge roughness and dry etch resistance.

"RAFT Technology for the Production of Advanced Resist Polymers"
Download: Paper [.pdf]

Copyright 2008 Society of Photo-Optical Instrumentation Engineers. This paper was published in proceedings from the February, 2008 Advances in Resist Materials and Processing Technology XXV Conference, and is made available as an electronic reprint (preprint) with permission of SPIE. One print or electronic copy may be made for personal use only. Systematic or multiple reproduction, distribution to multiple locations via electronic or other means, duplication of any material in this paper for a fee or for commercial purposes, or modification of the content of the paper are prohibited.

"New Amorphous Fluoropolymers of Tetrafluoroethylene with Fluorinated and Non-Fluorinated Tricyclononenes. Semiconductor Photoresists for Imaging at 157 and 193 nm. Macromolecules, 39, p.3252 (2006)
Download: Paper [.pdf]

Copyright 2006, American Chemical Society. Per ACS copyright policy, this web-accessible version is restricted to the abstract, figures, and tables contained in the full article.

"Bis(fluoroalcohol) Monomers and Polymers: Improved Transparency Fluoropolymer Photoresists for Semiconductor Photolithography at 157 nm. Macromolecules, 39, p.1443 (2006)
Download: Paper [.pdf]

Copyright 2006, American Chemical Society. Per ACS copyright policy, this web-accessible version is restricted to the abstract, figures, and tables contained in the full article.

"The Impact of Fluoropolymers on LER in 193nm Imaging," presentation at the 22nd Conference of Photopolymer Science and Technology, June 2005.
Download: Presentation [.pdf]

"Design of Fluoropolymer Photoresists for Advanced Microlithography in Manufacture of Computer Chips," presentation at the ACS National Meeting, August, 2004.
Download: Presentation [.pdf]

"Single Layer Fluoropolymer Resists for 157 nm Lithography," paper at the SPIE Microlithography Symposium, February, 2003.
Download: Paper [.pdf]