DuPont™ Zyron® electronic gases : Technical Information

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Technical Information Here you will find all the documents that are contained on our site: from data sheets and technical bulletins to presentations and material safety data sheets (MSDS). If you can't find something you are looking for, please contact us. Data Sheets Zyron® 8020 N3 Zyron® 116 N5 Cylinder Zyron® 116 N5 Ton Zyron® 116 N5 Bulk Zyron® C318 N4 Zyron® 23 N3 MSDS Zyron® 8020 N3 Zyron® 116 N5 Zyron® C318 N4 Zyron® 23 N3 Zyron® 23 N5 Product Literature Innovative Solutions from DuPont Semiconductor Fabrication Mateirals Zyron® Electronic Gases for Plasma Process Applications Zyron® NF3 Properties, Uses, Storage and Handling Zyron® 8020 Chamber Cleaning Gas - A Practical, Economical Solution for PECVD Tools Zyron® 8020 Chamber Cleaning Gas Conversion Helps Wafer Fabrication Facilities Meet Environmental Goals and Reduce Costs Pressure Drop Considerations in Gas Delivery Lines for Zyron® 8020 (c-C₄F₈ ) CVD Chamber Cleaning Gas High-Purity Fluorinated Gases for Plasma Etching Applications Specification and Measurement of Hydrogen Fluoride (HF) in High-Purity C₂F₆ (Zyron® 116) Hydrocarbon-Free Zyron® 116(C₂F₆ ) Oxide Etching in Inductively Coupled Plasma Tools with C₂HF₅ + C₂H₄F₂ (HFC-125 + HFC-152a) White Papers UMC Demonstrates Substantial Cost Savings and PFC Reduction by Replacing C₃F₈ with Zyron® C₄F₈ Chamber Cleaning Gas		Case Studies Reducing Cost and PFC Effluent with Optimized C₂F₆ Chamber Cleaning [.pdf] HDP Oxide Etch with C₄F₈, Etch Gas Purity Does Matter [.pdf]
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